This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2024.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2024
Title: Victor Theriault: Innovator in Ion Source Technology
Introduction
Victor Theriault is a notable inventor based in Hamilton, MA (US). He has made significant contributions to the field of ion source technology, particularly with his innovative designs that enhance plasma generation.
Latest Patents
Victor Theriault holds a patent for a "Shield for filament in an ion source." This invention involves a Bernas ion source equipped with a shield that is strategically placed between the filament and the chamber's first end. The shield serves to confine the plasma to a specific region, which can improve the efficiency of the ion source. It may be electrically connected to the negative leg of the filament, making it the most negatively biased component in the chamber. In some cases, the shield can be electrically floating, allowing it to self-bias. Typically made of refractory metal, this shield reduces back heating of the filament by the plasma, thereby minimizing the risk of thermal runaway. This innovation enables the generation of denser plasmas within the chamber.
Career Highlights
Victor Theriault is currently employed at Applied Materials, Inc., where he continues to develop cutting-edge technologies in the field of ion sources. His work has been instrumental in advancing the capabilities of plasma generation systems.
Collaborations
Some of Victor's coworkers include Klaus Becker and Luigi G Amato, who contribute to the collaborative environment at Applied Materials, Inc.
Conclusion
Victor Theriault's contributions to ion source technology exemplify the innovative spirit of modern inventors. His patent for a shield in an ion source demonstrates a significant advancement in the field, enhancing the efficiency and effectiveness of plasma generation.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
