West Hartford, CT, United States of America

Victor A Yakovlev



Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 32(Granted Patents)


Company Filing History:


Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: Victor A Yakovlev: Innovator in Thin Film Measurement Technology

Introduction

Victor A Yakovlev is a notable inventor based in West Hartford, CT (US). He has made significant contributions to the field of thin film measurement technology. His innovative approach has led to the development of a unique method for measuring the composition and properties of thin films using infrared radiation.

Latest Patents

Victor A Yakovlev holds a patent for a method and apparatus for measuring the composition and other properties of thin films utilizing infrared radiation. This invention allows for the measurement of composition, free carrier concentrations, and other properties of thin films and graded layers embedded in film stack structures. The method employs two novel algorithms to extract the composition of a measured layer independently of the effects of additional layers. It can be applied even when calibration samples are not available with the same layered structure as the samples being measured. The technique uses sample model-based analysis algorithms to derive the dielectric function of the layer, which is crucial for determining the material's composition more easily and unambiguously.

Career Highlights

Victor A Yakovlev is associated with MKS Instruments, Inc., where he continues to advance his research and development efforts. His work has significantly impacted the field of thin film technology, providing more reliable methods for product wafer analysis.

Collaborations

Victor has collaborated with notable colleagues such as Peter Rosenthal and Sylvie Charpenay, contributing to the advancement of measurement technologies in their field.

Conclusion

Victor A Yakovlev's innovative methods in thin film measurement have established him as a key figure in the industry. His contributions continue to influence the development of more efficient and reliable measurement techniques.

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