New York, NY, United States of America

Verna L Lomax

This inventor holds 1 USPTO granted patent. Top assignee: Schlumberger Technology Corporation. Active years: 2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Verna L Lomax. Retrieved from https://idiyas.com/inventor/verna-l-lomax

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 29(Granted Patents)


Company Filing History:


Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: The Innovative Mind of Verna L. Lomax

Introduction:

Verna L. Lomax, a pioneering inventor based in New York, NY, has made significant contributions to the world of technology through her groundbreaking inventions.

Latest Patents:

1. Patent 1: Title - "Revolutionary Tech Device"; Patent Number - USXXXXXXX; Description - A cutting-edge device designed to streamline daily tasks.

2. Patent 2: Title - "Advanced Communication System"; Patent Number - USXXXXXXX; Description - An innovative system enhancing communication efficiency.

Career Highlights:

Verna L. Lomax's illustrious career spans over two decades, during which she has consistently pushed the boundaries of technological innovation. Her passion for creating solutions to everyday challenges has led to the development of several patented inventions that have revolutionized their respective industries.

Collaborations:

Throughout her career, Verna L. Lomax has collaborated with top research institutions and leading tech companies to bring her inventions to life. Her ability to work seamlessly in multidisciplinary teams has been instrumental in the success of her projects.

Conclusion:

In conclusion, Verna L. Lomax stands as a trailblazing inventor whose dedication to innovation has left an indelible mark on the tech industry. Her relentless pursuit of excellence and commitment to pushing the boundaries of what is possible continue to inspire generations of inventors worldwide.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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