This inventor holds 1 USPTO granted patent. Top assignees: Metallgesellschaft Aktiengesellschaft, Norsk Hydro Technology A.s.. Active years: 1995.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1995
Title: Venkita Krishnan: Innovator in Vanadium Treatment Technologies
Introduction
Venkita Krishnan is a notable inventor based in Neu-Isenburg, Germany. He has made significant contributions to the field of material treatment, particularly focusing on vanadium-containing residues. His innovative approach has led to the development of a patented method that enhances the processing of these materials.
Latest Patents
Venkita Krishnan holds a patent titled "Method of treating a vanadium-containing residue." This patent describes a process where a vanadium-containing residue, which contains at least 5 weight percent carbon on an anhydrous basis, is thermally treated in a furnace. The treatment occurs at temperatures ranging from 400°C to 700°C under an oxidizing atmosphere, or at temperatures from 500°C to 1300°C under controlled oxygen partial pressures. The result is a solids mixture that contains at least 5 weight percent vanadium oxide, which can be withdrawn from the furnace using various types of thermal treatment equipment.
Career Highlights
Throughout his career, Venkita Krishnan has worked with prominent companies such as Metallgesellschaft Aktiengesellschaft and Norsk Hydro Technology A.S. His experience in these organizations has allowed him to refine his expertise in material processing and innovation.
Collaborations
Venkita has collaborated with notable professionals in his field, including Gurudas Samant and Christopher Higman. These partnerships have contributed to the advancement of his research and the successful implementation of his patented technologies.
Conclusion
Venkita Krishnan's work in the treatment of vanadium-containing residues showcases his innovative spirit and dedication to improving material processing techniques. His contributions to the field are significant and continue to influence advancements in this area.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile