Venkatanarayana Shankarmurthy

Title: Venkatanarayana Shankarmurthy: Innovator in Electronic Device Manufacturing

Introduction

Venkatanarayana Shankarmurthy is a notable inventor based in San Jose, CA. He has made significant contributions to the field of electronic device manufacturing. His innovative work focuses on improving the processes involved in substrate manufacturing.

Latest Patents

Venkatanarayana holds a patent for "Methods and mechanisms for adjusting film deposition parameters during substrate manufacturing." This patent describes an electronic device manufacturing system that can obtain metrology data associated with a deposition process performed on a substrate according to a process recipe. The system generates multiple layers on the substrate's surface and can obtain an expected profile associated with the process recipe. This expected profile includes values indicative of the desired thickness for the layers. The manufacturing system generates a correction profile based on the metrology data and the expected profile, which includes a deposition time offset value for at least one layer. Ultimately, the system generates an updated process recipe by applying the correction profile and performs a deposition step on the substrate according to this updated recipe. Venkatanarayana has 1 patent to his name.

Career Highlights

Venkatanarayana is currently employed at Applied Materials, Inc., a leading company in the field of materials engineering. His work at Applied Materials has allowed him to contribute to advancements in electronic device manufacturing technologies.

Collaborations

Throughout his career, Venkatanarayana has collaborated with talented individuals such as Mitesh Sanghvi and Yulian Yao. These collaborations have further enriched his work and contributed to the innovative projects he has been involved in.

Conclusion

Venkatanarayana Shankarmurthy is a distinguished inventor whose work in electronic device manufacturing has led to significant advancements in the industry. His contributions, particularly in adjusting film deposition parameters, showcase his commitment to innovation and excellence.