Carmel, IN, United States of America

Venkat R Ishwar




Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2013-2017

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2 patents (USPTO):Explore Patents

Title: Venkat R Ishwar: Innovator in High-Temperature Alloys

Introduction

Venkat R Ishwar is a notable inventor based in Carmel, Indiana, recognized for his contributions to the field of high-temperature oxidation-resistant alloys. With a total of two patents to his name, Ishwar has made significant advancements in materials science, particularly in the development of weldable alloys.

Latest Patents

Ishwar's latest patents include a weldable oxidation-resistant nickel-iron-chromium aluminum alloy. This innovative alloy is designed to withstand high temperatures while exhibiting low solidification crack sensitivity and good resistance to strain age cracking. The alloy composition includes by weight percent, 25% to 32% iron, 18% to 25% chromium, 3.0% to 4.5% aluminum, 0.2% to 0.6% titanium, 0.2% to 0.43% silicon, up to 0.5% manganese, and the balance nickel plus impurities. The Al+Ti content is specified to be between 3.4 and 4.2, with a Cr/Al ratio ranging from about 4.5 to 8.

Career Highlights

Venkat R Ishwar is currently employed at Haynes International, Inc., a company renowned for its expertise in high-performance alloys. His work at Haynes has positioned him as a key player in the development of advanced materials that meet the demanding requirements of various industries.

Collaborations

Ishwar has collaborated with notable colleagues, including Dwaine L Klarstrom and Steven J Matthews, contributing to the innovative environment at Haynes International, Inc. Their combined expertise fosters a culture of creativity and advancement in alloy technology.

Conclusion

Venkat R Ishwar's contributions to the field of high-temperature alloys exemplify the spirit of innovation and dedication to material science. His patents reflect a commitment to developing solutions that enhance performance and reliability in demanding applications.

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