Karnataka, India

Ved Prakash Anand

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electro-Mechanics Co., Ltd.. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ved Prakash Anand. Retrieved from https://idiyas.com/inventor/ved-prakash-anand

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Ved Prakash Anand: Innovator in Image Data Processing

Introduction

Ved Prakash Anand is a notable inventor based in Karnataka, India. He has made significant contributions to the field of image data processing. His innovative approach has led to the development of a unique method that enhances the efficiency of image data handling.

Latest Patents

Anand holds a patent for a method of processing image data. This method involves setting a permissible pitch range for the distance between adjacent ink blots. It includes arranging image data for the line pattern in an x-y coordinate system. The process also entails selecting a base point and a determination point, determining distances, and storing coordinates as print data if they meet specific criteria. This patent showcases his expertise in optimizing image processing techniques. He has 1 patent to his name.

Career Highlights

Ved Prakash Anand is currently employed at Samsung Electro-Mechanics Co., Ltd. His role at the company allows him to apply his innovative ideas in a practical setting. His work has contributed to advancements in technology and has positioned him as a valuable asset in his field.

Collaborations

Anand has collaborated with notable colleagues such as Kwan-Soo Yun and Sang-Do Cho. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Ved Prakash Anand is a distinguished inventor whose work in image data processing has made a significant impact. His contributions continue to influence the field and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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