Company Filing History:
Years Active: 2009
Title: **Innovative Contributions of Vasilli Zhakhovski in Extreme Ultraviolet Light Sources**
Introduction
Vasilli Zhakhovski, a notable inventor located in Osaka, Japan, has made significant strides in the field of extreme ultraviolet (EUV) technology. With one patent to his name, his work promises to enhance the efficiency of light sources critical for various applications in science and industry.
Latest Patents
Zhakhovski's sole patent focuses on an extreme ultraviolet light source and its corresponding target. The primary objective of this innovation is to develop a target that emits extreme ultraviolet light with high emission efficiency. The target is constructed from a heavy metal or heavy-metal compound and exhibits a density between 0.5 to 80% of the crystal density. Upon irradiation with a laser beam, the target generates plasma from the heavy metal, allowing for the emission of extreme ultraviolet light at specific wavelengths based on the type of heavy metal used. This design effectively controls the space distribution of the generated plasma and enhances energy absorption, ultimately improving emission efficiency.
Career Highlights
Vasilli Zhakhovski is currently affiliated with Osaka University, where he continues to innovate in the domain of extreme ultraviolet light sources. His research has positioned him at the forefront of advancements in this specialized field, enabling practical applications that could revolutionize various technologies reliant on ultraviolet light. His patent exemplifies a forward-thinking approach to engineering and materials science.
Collaborations
Throughout his career, Zhakhovski has collaborated with esteemed colleagues such as Keiji Nagai and Hiroaki Nishimura. Their combined expertise has fostered significant advancements in their research endeavors, particularly in the creation and refinement of materials suitable for extreme ultraviolet applications.
Conclusion
Vasilli Zhakhovski stands out as an inventor dedicated to pushing the boundaries of extreme ultraviolet light technologies. His patent not only showcases his innovative capabilities but also lays the groundwork for enhanced emission efficiency, vital for future scientific and industrial applications. As his career progresses, the impact of his contributions will likely resonate within the scientific community and beyond.