Company Filing History:
Years Active: 1993-2003
Title: Vance E Hoffman, Jr: Innovator in Sputtering Technology
Introduction
Vance E Hoffman, Jr. is a notable inventor based in Los Altos, CA (US). He has made significant contributions to the field of sputtering technology, holding a total of 5 patents. His work focuses on improving the efficiency and effectiveness of deposition processes.
Latest Patents
Hoffman's latest patents include a collimated deposition apparatus and a sputtering apparatus that utilizes a collimating filter. The sputtering apparatus is designed to limit the angles at which sputtered particles reach the substrate or workpiece being processed. This innovation relies on a combination of a planar sputter source that is larger than the workpiece and has uniform emission characteristics. The collimating filter is crucial in maintaining low operating pressure to prevent scattering of sputtered atoms. In one embodiment, a titanium collimation filter is used for depositing films of titanium, titanium nitride, or titanium/tungsten alloy. The collimated deposition apparatus is particularly suitable for forming step coatings, ensuring that particles are emitted uniformly and directed accurately towards the workpiece.
Career Highlights
Throughout his career, Vance E Hoffman, Jr. has worked with prominent companies such as Varian Associates, Inc. and Novellus Systems Incorporated. His experience in these organizations has allowed him to refine his expertise in sputtering technology and contribute to advancements in the field.
Collaborations
Hoffman has collaborated with notable individuals in the industry, including Ronald R Cochran and John C Helmer. These collaborations have further enriched his work and led to innovative solutions in sputtering technology.
Conclusion
Vance E Hoffman, Jr. is a distinguished inventor whose contributions to sputtering technology have had a lasting impact. His innovative patents and career achievements reflect his dedication to advancing the field.