Villeparisis, France

Valérie Legros

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Rhodia Operations. Active years: 2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Valérie Legros. Retrieved from https://idiyas.com/inventor/valérie-legros

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2012

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1 patent (USPTO):Explore Patents

Title: Valérie Legros: Innovator in Anti-Graffiti Treatments

Introduction

Valérie Legros is a notable inventor based in Villeparisis, France. He has made significant contributions to the field of anti-graffiti treatments, showcasing his innovative spirit and dedication to improving environmental aesthetics.

Latest Patents

Valérie Legros holds a patent for an anti-graffiti treatment. This invention relates to the use of a specific dicarboxylic acid diester, which demonstrates improved efficiency in graffiti-suppressing treatments. His work in this area highlights the importance of developing effective solutions to combat graffiti vandalism.

Career Highlights

Valérie Legros is associated with Rhodia Operations, a company known for its commitment to innovation and sustainability. His role there has allowed him to focus on developing advanced materials and treatments that address real-world challenges.

Collaborations

Throughout his career, Valérie has collaborated with talented individuals such as Jean-Emille Zanetto and Valérie Billebaud. These partnerships have fostered a creative environment that encourages the exchange of ideas and expertise.

Conclusion

Valérie Legros stands out as an inventor dedicated to enhancing anti-graffiti solutions through innovative treatments. His contributions reflect a commitment to improving urban environments and addressing the challenges posed by graffiti.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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