Midland, MI, United States of America

Valeris J Bujanowski

This inventor holds 2 USPTO granted patents. Top assignee: Dow Corning Corporation. Active years: 1997.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Valeris J Bujanowski. Retrieved from https://idiyas.com/inventor/valeris-j-bujanowski

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 2

Forward Citations = 29(Granted Patents)


Company Filing History:


Years Active: 1997

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2 patents (USPTO):Explore Patents

Title: Valeris J Bujanowski: Innovator in Radiation Curable Compositions

Introduction

Valeris J Bujanowski is a notable inventor based in Midland, MI (US). He has made significant contributions to the field of radiation curable compositions, holding two patents that showcase his innovative spirit and technical expertise.

Latest Patents

Bujanowski's latest patents focus on radiation curable compositions containing vinyl ether functional siloxanes. These compositions utilize aromatic iodonium salt or aromatic sulfonium salt photoinitiators that cure upon exposure to ultraviolet or electron beam radiation. The inventions are particularly relevant for applications in pressure-sensitive release technologies.

Career Highlights

Valeris J Bujanowski is associated with Dow Corning Corporation, where he has been instrumental in advancing the company's research and development efforts. His work has contributed to the development of new materials and technologies that enhance product performance and application versatility.

Collaborations

Bujanowski has collaborated with notable colleagues, including Shedric Oneal Glover and Maris J Ziemelis. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Valeris J Bujanowski's contributions to the field of radiation curable compositions highlight his role as a leading inventor. His patents reflect a commitment to advancing technology and improving industrial applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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