Company Filing History:
Years Active: 1983
Title: Valeria Platter: Innovator in Semiconductor Technology
Introduction
Valeria Platter is a distinguished inventor based in Poughkeepsie, NY (US). She has made significant contributions to the field of semiconductor technology, particularly through her innovative patent.
Latest Patents
Valeria holds a patent titled "Method for forming planar metal/insulator structures." This invention focuses on the formation of planar conductor/insulator semiconductor devices utilizing hafnium-coated aluminum-based metallization with a magnesium oxide mask for dry etching of the metallization and deposition of planar insulation. The hafnium coating serves to protect the aluminum metallization during mask removal and acts as a registration enhancer for subsequent electron-beam processing. Valeria has 1 patent to her name.
Career Highlights
Valeria is currently employed at International Business Machines Corporation, commonly known as IBM. Her work at IBM has allowed her to explore and develop advanced technologies in the semiconductor industry.
Collaborations
Throughout her career, Valeria has collaborated with notable colleagues, including Laura Beth Rothman and Paul M Schaible. These partnerships have contributed to her success and the advancement of her projects.
Conclusion
Valeria Platter is a remarkable inventor whose work in semiconductor technology has made a lasting impact. Her innovative approaches and collaborations continue to shape the future of the industry.