Teaneck, NJ, United States of America

Valentin R Loureiro

This inventor holds 1 USPTO granted patent. Top assignee: Witco Chemical Corporation. Active years: 1984.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Valentin R Loureiro. Retrieved from https://idiyas.com/inventor/valentin-r-loureiro

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 1984

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1 patent (USPTO):Explore Patents

Title: Innovations of Valentin R Loureiro in Spray Drying Technology.

Introduction

Valentin R Loureiro is an accomplished inventor based in Teaneck, NJ (US). He has made significant contributions to the field of spray drying technology, particularly through his innovative methods that enhance energy efficiency.

Latest Patents

Loureiro holds a patent for a spray drying method that focuses on energy-efficient processes for drying aqueous liquids. This method involves withdrawing spent drying gas from the spray dryer and spraying it with water adiabatically to cool the gas and increase its water content. The process also includes recycling a portion of the humidified gas back to the furnace, with the recycled portion ranging from about 40 percent to about 70 percent of the total humidified gas. This innovative approach not only improves efficiency but also reduces energy consumption in the drying process.

Career Highlights

Valentin R Loureiro is associated with Witco Chemical Corporation, where he applies his expertise in chemical processes and innovations. His work has been instrumental in advancing the company's capabilities in spray drying technology.

Conclusion

Valentin R Loureiro's contributions to spray drying technology exemplify the importance of innovation in enhancing energy efficiency in industrial processes. His patent reflects a commitment to developing sustainable solutions in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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