Denver, CO, United States of America

Val Zaturensky

This inventor holds 1 USPTO granted patent. Top assignee: Engineered Data Products, Inc.. Active years: 2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Val Zaturensky. Retrieved from https://idiyas.com/inventor/val-zaturensky

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: Val Zaturensky: Innovator in Work Surface Technology

Introduction

Val Zaturensky is a notable inventor based in Denver, Colorado. He has made significant contributions to the field of work surface technology. His innovative designs aim to enhance functionality and efficiency in various work environments.

Latest Patents

Zaturensky holds a patent for a "Removable Work Surface Defining Device." This invention features a pair of rigid support members that can be attached to a support structure. The device includes a platform that defines a work surface, surrounded by spaced apart edge portions. It also incorporates quick release locking mechanisms that allow for easy attachment and detachment of the platform. This design facilitates the movement of the platform between different positions, enhancing its usability.

Career Highlights

Val Zaturensky is associated with Engineered Data Products, Inc., where he applies his expertise in developing innovative solutions. His work focuses on creating products that improve the efficiency of workspaces. Zaturensky's dedication to innovation has positioned him as a key figure in his field.

Collaborations

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Conclusion

Val Zaturensky's contributions to work surface technology exemplify the spirit of innovation. His patented designs continue to influence the way workspaces are organized and utilized.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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