Myyrmaki, Finland

Vaino Era

This inventor holds 1 USPTO granted patent. Top assignee: Other. Active years: 1978.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Vaino Era. Retrieved from https://idiyas.com/inventor/vaino-era-mi1o4g55

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:

goldMedal1 out of 834,570 
Other
 patents

Years Active: 1978

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Vaino Era: Innovator in Polyurethane Film Manufacturing

Introduction

Vaino Era is a notable inventor based in Myyrmaki, Finland. He has made significant contributions to the field of polyurethane film manufacturing. His innovative methods have the potential to impact various industries that utilize surface coatings.

Latest Patents

Vaino Era holds a patent for a "Method for manufacturing polyurethane films and surface coatings from tall oil pitch." This method involves esterifying tall oil pitch with specific aliphatic alcohols and heat treatment to achieve desired acid and hydroxyl numbers. The process includes the addition of aliphatic triisocyanate and known dilution agents, leading to the polymerization of the mixture into films or surface coatings.

Career Highlights

Throughout his career, Vaino Era has focused on developing efficient methods for producing high-quality polyurethane films. His work has garnered attention for its innovative approach to utilizing tall oil pitch, a renewable resource, in manufacturing processes.

Collaborations

Vaino Era has collaborated with notable coworkers, including Matti Dolk and Jarl Johan Lindberg. Their combined expertise has contributed to advancements in the field of polyurethane technology.

Conclusion

Vaino Era's contributions to the manufacturing of polyurethane films highlight his innovative spirit and dedication to advancing material science. His patent reflects a significant step forward in utilizing sustainable resources for industrial applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…