Edmonton, Canada

Vadym Suprun

This inventor holds 1 USPTO granted patent. Top assignee: Leia Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Vadym Suprun. Retrieved from https://idiyas.com/inventor/vadym-suprun

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Vadym Suprun: Innovator in Multiview Image Generation

Introduction

Vadym Suprun is a notable inventor based in Edmonton, Canada. He has made significant contributions to the field of image processing and display technologies. His innovative work focuses on enhancing the way multiview images are generated and displayed.

Latest Patents

Vadym Suprun holds a patent for a "View synthesis system and method using depth map." This invention allows a computing device to synthesize view images of a multiview image of a scene from a color image and a depth map. Each view image includes color values at respective pixel locations. The computing device can render these view images on a multiview display, enhancing the visual experience.

Career Highlights

Vadym Suprun is currently associated with Leia Inc., where he applies his expertise in image synthesis and display technologies. His work at Leia Inc. focuses on advancing the capabilities of multiview displays, making them more efficient and effective for users.

Collaborations

Due to space constraints, the collaborations section will be omitted.

Conclusion

Vadym Suprun's contributions to multiview image generation and display technologies highlight his innovative spirit and dedication to advancing the field. His patent and work at Leia Inc. demonstrate his commitment to enhancing visual experiences through technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…