Tokyo, Japan

Vadym Mochalin

This inventor holds 1 USPTO granted patent. Top assignees: Daicel Corporation, University of Missouri. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Vadym Mochalin. Retrieved from https://idiyas.com/inventor/vadym-mochalin-wrgzfcv5

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Vadym Mochalin: Innovator in Nanodiamond Technology

Introduction

Vadym Mochalin is a prominent inventor based in Tokyo, Japan. He is known for his significant contributions to the field of nanotechnology, particularly in the disaggregation of nanodiamond particles. His innovative methods have the potential to advance various applications in materials science and engineering.

Latest Patents

Vadym Mochalin holds 1 patent for his work titled "Disaggregation of nanodiamond particles." This patent outlines methods for disaggregating nanodiamond clusters, utilizing techniques such as sonication to break apart nanodiamond aggregates in an aqueous slurry with an alkaline pH. The methods described in his patent enable the production of compositions, including aqueous nanodiamond dispersions and dry particulate compositions.

Career Highlights

Throughout his career, Vadym has worked with notable organizations, including Daicel Corporation and the University of Missouri. His experience in these institutions has allowed him to develop and refine his innovative techniques in nanotechnology.

Collaborations

Vadym has collaborated with esteemed colleagues such as Atsushi Kume and Yoshihiro Inamoto. These partnerships have contributed to the advancement of his research and the successful application of his patented methods.

Conclusion

Vadym Mochalin's work in nanodiamond technology exemplifies the impact of innovative thinking in scientific research. His contributions continue to influence the field and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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