Moscow, Russia

Vadim Lishchinskiy

This inventor holds 1 USPTO granted patent. Top assignee: Reliance Industries Limited. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Vadim Lishchinskiy. Retrieved from https://idiyas.com/inventor/vadim-lishchinskiy

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Vadim Lishchinskiy: Innovator in Rubber Technology

Introduction

Vadim Lishchinskiy is a prominent inventor based in Moscow, Russia. He has made significant contributions to the field of rubber technology, particularly through his innovative processes. His work focuses on enhancing the efficiency and economic viability of rubber production.

Latest Patents

Vadim holds a patent for a "Process for preparing halogenated isobutylene isoprene rubber." This process involves polymerizing isoprene and isobutylene monomers, followed by halogenation using a halogenating agent. The method is noted for being simple, energy-efficient, and cost-effective, making it a valuable advancement in rubber manufacturing.

Career Highlights

Vadim is associated with Reliance Industries Limited, where he applies his expertise in rubber technology. His innovative approach has positioned him as a key figure in the industry, contributing to advancements that benefit both production processes and product quality.

Collaborations

Vadim has worked alongside talented professionals such as Dmitry Khrichenko and Romal Ramkrushna Chafle. Their collaborative efforts have furthered research and development in the field of rubber technology.

Conclusion

Vadim Lishchinskiy is a notable inventor whose work in rubber technology exemplifies innovation and efficiency. His contributions continue to impact the industry positively, showcasing the importance of advancements in material science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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