This inventor holds 1 USPTO granted patent. Top assignee: Midwest Research Institute. Active years: 2000.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2000
Title: Vadim G Gerlivanov: Innovator in High Purity Silane Preparation
Introduction
Vadim G Gerlivanov is a notable inventor based in Moscow, Russia. He has made significant contributions to the field of semiconductor technology through his innovative methods. His work focuses on the preparation of high purity silane, which is essential for various applications in semiconductor devices.
Latest Patents
Vadim G Gerlivanov holds a patent for a method of high purity silane preparation. This process involves a temperature-assisted reaction of metallurgical silicon with alcohol in the presence of a catalyst. The synthesis begins with the formation of alcoxysilanes, which are then separated and purified. The method includes simultaneous reduction and oxidation of alcoxysilanes to produce gaseous silane and liquid secondary products. The purification of silane is achieved through an impurity adsorption technique, ensuring high purity levels suitable for industrial applications.
Career Highlights
Vadim is associated with the Midwest Research Institute, where he continues to advance his research in semiconductor materials. His innovative approach to silane preparation has positioned him as a key figure in the field. His work not only contributes to the development of high purity silicon structures but also enhances the efficiency of semiconductor devices.
Collaborations
Vadim has collaborated with notable colleagues, including Nikolai N Korneev and Akhsarbek B Pinov. These collaborations have fostered a productive research environment, leading to advancements in their respective fields.
Conclusion
Vadim G Gerlivanov's contributions to the preparation of high purity silane are invaluable to the semiconductor industry. His innovative methods and collaborative efforts continue to drive progress in technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
