V Walter Kunc

Title: V Walter Kunc: Innovator in Convective Thermal Removal of Gaseous Inclusions

Introduction

V Walter Kunc is an accomplished inventor based in Clarendon Hills, IL (US). He has made significant contributions to the field of thermal processing, particularly in the removal of gaseous inclusions from viscous liquids. His innovative approach has led to the development of a patented method that enhances the quality of viscous liquids in various applications.

Latest Patents

Kunc holds a patent for a method titled "Convective thermal removal of gaseous inclusions from viscous liquids." This patent describes a process where a viscous liquid stream containing gaseous inclusions is introduced into a refining chamber. The method involves creating a flowing viscous liquid layer, reducing the viscosity of a bottom portion in a first refining zone, and subsequently introducing heat from above in a second refining zone. This process effectively reduces gaseous inclusions, resulting in a cleaner viscous liquid that can be discharged from the chamber.

Career Highlights

Kunc is associated with the Gas Technology Institute, where he applies his expertise in thermal processing. His work focuses on improving methods for refining viscous liquids, which has implications for various industries, including chemical processing and materials science. His innovative solutions have contributed to advancements in the efficiency and effectiveness of liquid refining processes.

Collaborations

Throughout his career, Kunc has collaborated with notable colleagues, including David M Rue and John Charles Wagner. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas, further enhancing the impact of their work in the field.

Conclusion

V Walter Kunc's contributions to the field of thermal processing through his patented method for removing gaseous inclusions from viscous liquids exemplify his innovative spirit. His work at the Gas Technology Institute and collaborations with esteemed colleagues highlight his commitment to advancing technology in this area.