Company Filing History:
Years Active: 2013-2021
Title: Uwe Paul Haller: Innovator in Wafer Processing Technologies
Introduction
Uwe Paul Haller is a notable inventor based in San Jose, CA, with a focus on advancements in wafer processing technologies. He holds a total of 4 patents that contribute significantly to the field of semiconductor manufacturing. His work emphasizes the importance of precise temperature control and substrate processing techniques.
Latest Patents
One of Haller's latest patents is for a virtual sensor for spatially resolved wafer temperature control. This invention relates to methods and apparatus for temperature sensing and control during substrate processing. It addresses the challenges of measuring substrate temperatures directly by utilizing film properties and changes in power output over time. The developed models, built using machine learning techniques, help adjust heating apparatus setpoints for future processing operations.
Another significant patent involves a method and apparatus for processing wafers with compressive or tensile stress at elevated temperatures in a plasma-enhanced chemical vapor deposition system. This invention features an electrostatic chuck designed to maintain substrate flatness during high-temperature processing. The chuck body is made from aluminum nitride material, optimizing performance around 600°C or above during deposition or etch processes.
Career Highlights
Uwe Paul Haller is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His contributions to wafer processing technologies have been instrumental in enhancing manufacturing efficiency and product quality.
Collaborations
Haller has collaborated with notable coworkers such as Jianhua Zhou and Hari Kishore Ambal, further enriching the innovation landscape within his field.
Conclusion
Uwe Paul Haller's work exemplifies the critical advancements in wafer processing technologies, showcasing his commitment to innovation in the semiconductor industry. His patents reflect a deep understanding of the complexities involved in substrate processing and temperature control.