Company Filing History:
Years Active: 1984-1986
Title: Uwe Klinsmann: Innovator in Photopolymer Technology
Introduction
Uwe Klinsmann is a notable inventor based in Mannheim, Germany. He has made significant contributions to the field of photopolymer technology, holding 2 patents that showcase his innovative approach to materials suitable for various applications.
Latest Patents
His latest patents include a photopolymerizable recording material suitable for the production of photoresist layers. This invention involves materials that contain one or more thermoplastic vinyl polymers as the binder, along with low molecular weight, ethylenically unsaturated, photopolymerizable compounds and photoinitiators. These materials exhibit excellent adhesion to metallic substrate surfaces when the binder is a vinyl polymer with amino and/or imino groups. Another significant patent focuses on the production of relief images or resist images through a negative-working method. This process utilizes a photosensitive resist layer that contains compounds with aromatic and/or heteroaromatic o-nitrocarbinol ester groups, enabling the creation of high-quality images through selective thermal hardening and crosslinking.
Career Highlights
Uwe Klinsmann is currently associated with BASF Aktiengesellschaft, a leading chemical company known for its innovative solutions. His work at BASF has allowed him to explore and develop advanced materials that push the boundaries of photopolymer technology.
Collaborations
Throughout his career, Uwe has collaborated with esteemed colleagues such as Reinhold J Leyrer and Helmut Barzynski. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.
Conclusion
Uwe Klinsmann's contributions to photopolymer technology through his patents reflect his innovative spirit and dedication to advancing material science. His work continues to influence the industry and inspire future developments in the field.