Basf Aktiengesellschaft

Uwe Klinsmann

Reinhold J Leyrer

Axel Sanner

Helmut Barzynski

Albert Elzer

Albrecht Eckell

Dietrich Saenger

Photopolymerizable recording materials which are suitable for the production of photoresist layers, and contain one or more thermoplastic vinyl polymers as the binder, one or more low molecular weight, ethylenically unsaturated, photopolymerizable compounds and one or more photoinitiators, with or without other, conventional additives and/or assistants, have excellent adhesion to metallic substrate surfaces if the binder employed is a vinyl polymer which possesses amino and/or imino groups.

Photopolymerizable recording material suitable for the production of

Relief images or resist images are produced by a negative-working process, using a photosensitive resist layer which is applied on a base and contains a compound possessing two or more aromatic and/or heteroaromatic o-nitrocarbinol ester groups as well as a crosslinking compound possessing two or more reactive groups which are capable, under the action of heat, of reacting with carboxyl groups to form a covalent chemical bond. To produce the relief images or resist images, the photosensitive resist layer is first exposed imagewise to actinic light, the exposed areas of this layer are subjected to selective thermal hardening and crosslinking and the resist layer is then post-exposed uniformly to actinic light and finally washed out with an aqueous developer.

Production of relief images or resist images by a negative-working method

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Mannheim, Germany

Uwe Klinsmann