Queidersbach, Germany

Uwe Duesterwald


Average Co-Inventor Count = 4.4

ph-index = 1


Company Filing History:


Years Active: 2006-2017

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3 patents (USPTO):Explore Patents

Title: Uwe Duesterwald: Innovator in Radiation-Curable Mixtures

Introduction

Uwe Duesterwald is a notable inventor based in Queidersbach, Germany. He has made significant contributions to the field of radiation-curable mixtures, holding a total of 3 patents. His work focuses on developing innovative solutions that enhance the properties and applications of polymer materials.

Latest Patents

Duesterwald's latest patents include a radiation-curable mixture containing low-molecular, ethylenically unsaturated compounds with non-aromatic ring systems. This mixture comprises a polymer obtained by polymerizing at least one free-radically polymerizable compound and at least one compound with an ethylenically unsaturated, free-radically polymerizable group. Notably, at least 10% by weight of these compounds feature non-aromatic ring systems. Another significant patent describes a process for preparing solutions of radiation-sensitive, free-radically polymerizable organic compounds. This process involves the esterification of a first starting compound with an acid halide group and a second starting compound with an alcoholic hydroxyl group in a specific solvent mixture.

Career Highlights

Throughout his career, Uwe Duesterwald has worked with prominent companies such as BASF SE Corporation and BASF Aktiengesellschaft. His experience in these organizations has allowed him to develop and refine his innovative ideas in polymer chemistry.

Collaborations

Duesterwald has collaborated with notable colleagues, including Ulrike Licht and Dirk Wulff. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.

Conclusion

Uwe Duesterwald's contributions to the field of radiation-curable mixtures demonstrate his commitment to innovation and excellence in polymer chemistry. His patents reflect a deep understanding of the complexities involved in developing advanced materials for various applications.

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