Worms, Germany

Ute Pospesch

This inventor holds 1 USPTO granted patent. Top assignee: Grace Gmbh & Co. Kg. Active years: 2004.


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: Ute Pospesch: Innovator in Matting Agent Technology

Introduction

Ute Pospesch is a notable inventor based in Worms, Germany. She has made significant contributions to the field of coatings through her innovative work on matting agents. Her expertise and dedication have led to the development of a unique patent that enhances the performance of radiation curable coatings.

Latest Patents

Ute Pospesch holds a patent for a matting agent composition that comprises silica and wax. This composition features a median particle size in the range of about 2-12 microns and a wax content of approximately 15-30 wt. %. The silica used in the composition has a pore volume ranging from about 0.8 to 1.4 cc/g. This matting agent is particularly suitable for radiation curable coatings, demonstrating efficiency and consistent gloss across varying coat weights.

Career Highlights

Throughout her career, Ute has been associated with Grace GmbH & Co. KG, where she has applied her innovative ideas to develop advanced coating solutions. Her work has not only contributed to the company's success but has also positioned her as a leader in her field.

Collaborations

Ute Pospesch has collaborated with esteemed colleagues such as David Joseph Kent and Georg Lueers. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Ute Pospesch's contributions to the field of matting agents and coatings exemplify her innovative spirit and dedication to advancing technology. Her patent reflects her commitment to improving the performance of radiation curable coatings, making her a significant figure in the industry.

Profile summary based on public USPTO records.
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