Oarai, Japan

Uno Osamu

This inventor holds 1 USPTO granted patent. Top assignees: Doryokuro Kakunenryo Kaihatsu Jigyodan, Nisco Kabushiki Kaisha. Active years: 1978.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Uno Osamu. Retrieved from https://idiyas.com/inventor/uno-osamu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 1978

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1 patent (USPTO):Explore Patents

Title: Innovations of Uno Osamu

Introduction

Uno Osamu is a notable inventor based in Oarai, Japan. He is recognized for his contributions to the field of liquid level detection technology. His innovative approach has led to the development of a unique apparatus that enhances the accuracy of detecting conductive liquid levels.

Latest Patents

Uno Osamu holds a patent for an "Apparatus for detecting conductive liquid level." This invention involves a liquid level detecting probe equipped with an exciting coil, a level detecting coil, and a temperature compensating coil, all housed within a non-magnetic sheath. The apparatus is designed to maintain a constant temperature and accurately detect the level of liquid metal by processing induced output voltages.

Career Highlights

Throughout his career, Uno Osamu has worked with several companies, including Doryokuro Kakunenryo Kaihatsu Jigyodan and Nisco Kabushiki Kaisha. His experience in these organizations has contributed to his expertise in the field of liquid detection technologies.

Collaborations

Uno Osamu has collaborated with notable individuals such as Mitsuru Kamei and Ogawa Toru. These partnerships have likely enriched his work and led to further advancements in his inventions.

Conclusion

Uno Osamu's innovative contributions to liquid level detection technology demonstrate his significant impact in the field. His patent and collaborations reflect a commitment to advancing technology for practical applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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