Jena, Germany

Ulrich Basler

This inventor holds 1 USPTO granted patent. Top assignee: Balzers Und Leybold Deutschland Holding Ag. Active years: 1998.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ulrich Basler. Retrieved from https://idiyas.com/inventor/ulrich-basler

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 1998

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1 patent (USPTO):Explore Patents

Title: Ulrich Basler: Innovator in Optical Measurement Technology

Introduction

Ulrich Basler is a notable inventor based in Jena, Germany. He has made significant contributions to the field of optical measurement technology. His innovative work has led to the development of a patented process and apparatus that enhances the measurement of chromaticity in thin films.

Latest Patents

Ulrich Basler holds a patent for a "Process and apparatus for spectral reflectance and transmission." This optical measuring apparatus is designed to determine the chromaticity of thin films on a substrate. It includes a light source that illuminates the substrate and a measuring apparatus that disperses light into various wavelengths. The apparatus makes wavelength-dependent intensity measurements, ensuring accurate results.

Career Highlights

Basler's career is marked by his work at Balzers und Leybold Deutschland Holding AG. His expertise in optical measurement has been instrumental in advancing the technology used in this field. He has developed methods to correct long-term and short-term instabilities in measurements, enhancing the reliability of the results.

Collaborations

Ulrich Basler has collaborated with notable colleagues such as Peter Kappel and Werner Lenz. Their combined efforts have contributed to the success of various projects within the company.

Conclusion

Ulrich Basler's innovative contributions to optical measurement technology have established him as a key figure in his field. His patented processes and collaborative efforts continue to influence advancements in the measurement of thin films.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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