Golm, Germany

Ullrich Scherf

This inventor holds 1 USPTO granted patent. Top assignee: Other. Active years: 2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ullrich Scherf. Retrieved from https://idiyas.com/inventor/ullrich-scherf-b1087eot

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 24(Granted Patents)


Company Filing History:

goldMedal1 out of 834,513 
Other
 patents

Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: Ullrich Scherf: Innovator in Polyfluorenes

Introduction

Ullrich Scherf is a notable inventor based in Golm, Germany. He has made significant contributions to the field of materials science, particularly in the development of polyfluorenes. His work has implications for various applications, including electronics and optoelectronics.

Latest Patents

Ullrich Scherf holds a patent for "End-capped polyfluorenes, films and devices based thereon." This invention relates to polyfluorenes that are end-capped with at least one charge-transporting moiety, along with films and devices that utilize these materials. His innovative approach enhances the performance and functionality of devices that incorporate these films.

Career Highlights

Throughout his career, Ullrich Scherf has focused on advancing the understanding and application of polymeric materials. His research has led to breakthroughs that are essential for the development of new technologies in the field of organic electronics.

Collaborations

Ullrich Scherf has collaborated with esteemed colleagues, including Akio Yasuda and Wolfgang Knoll. These partnerships have fostered a rich exchange of ideas and have contributed to the success of his research endeavors.

Conclusion

Ullrich Scherf's contributions to the field of polyfluorenes exemplify the impact of innovative thinking in materials science. His patent and collaborative efforts continue to influence advancements in technology and materials.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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