Company Filing History:
Years Active: 2007
Title: Ulf Weidenmuller: Innovator in Shadow Mask Technology
Introduction
Ulf Weidenmuller is a notable inventor based in Bochum, Germany. He has made significant contributions to the field of ion beam technology, particularly through his innovative patent related to shadow masks.
Latest Patents
Ulf Weidenmuller holds a patent for a "Shadow mask and method for producing a shadow mask." This invention involves a shadow mask designed for ion beams, which comprises a silicon wafer with a specific hole pattern. The silicon wafer features a metallic coating on the side facing the incident ion beams, effectively stopping the beams and dissipating heat. The apertured region of the silicon wafer has a thickness ranging from about 20 µm to about 200 µm, with apertures in the shadow mask having lateral dimensions from about 0.5 µm to about 3 µm. This patent showcases his expertise and innovation in the field.
Career Highlights
Ulf Weidenmuller is affiliated with the University of Kassel, where he continues to contribute to research and development in his area of expertise. His work has garnered attention for its practical applications in technology involving ion beams.
Collaborations
Ulf has collaborated with notable colleagues such as Jan Meijer and Andreas Stephan, enhancing the research environment and fostering innovation within his field.
Conclusion
Ulf Weidenmuller is a distinguished inventor whose work on shadow mask technology has made a significant impact in the realm of ion beam applications. His contributions continue to influence advancements in this specialized area of research.