Rimforsa, Sweden

Ulf Helmersson

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Sandvik Intellectual Property Ab. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ulf Helmersson. Retrieved from https://idiyas.com/inventor/ulf-helmersson-k9xc9xvn

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Ulf Helmersson: Innovator in PVD Coating Technology

Introduction

Ulf Helmersson is a notable inventor based in Rimforsa, Sweden. He has made significant contributions to the field of physical vapor deposition (PVD) coatings. His innovative methods have advanced the technology used in various industrial applications.

Latest Patents

Ulf Helmersson holds a patent for a method of producing PVD coatings. The patent, titled "Method for producing PVD coatings," describes a process that involves using High Power Impulse Magnetron Sputtering (HIPIMS). This method operates on one or more targets in an argon and reactive gas mixture at peak pulse power higher than 200 W/cm². The invention improves the deposition rate and eliminates the need for partial reactive gas pressure feedback systems. He has 1 patent to his name.

Career Highlights

Ulf Helmersson is associated with Sandvik Intellectual Property AB, where he continues to develop and refine his innovative techniques. His work has been instrumental in enhancing the efficiency and effectiveness of PVD coating processes.

Collaborations

Ulf collaborates with Erik Wallin, contributing to advancements in their field through shared expertise and innovative ideas.

Conclusion

Ulf Helmersson's contributions to PVD coating technology exemplify the impact of innovation in industrial applications. His patented methods are paving the way for more efficient manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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