Natick, MA, United States of America

Udrekh Gavale

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Sick Inc.. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Udrekh Gavale. Retrieved from https://idiyas.com/inventor/udrekh-gavale

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Udrekh Gavale: Innovator in Measurement Technology

Introduction

Udrekh Gavale is a notable inventor based in Natick, MA (US). He has made significant contributions to the field of measurement technology. His innovative approach has led to the development of a unique patent that addresses the challenges of measuring dimensions of target objects.

Latest Patents

Udrekh Gavale holds a patent for a "Method and system for measuring dimensions of a target object." This invention relates to a method that effectively measures the dimensions of various target objects, showcasing his expertise in precision measurement.

Career Highlights

Gavale is currently associated with Sick Inc., a company known for its advanced sensor solutions. His work at Sick Inc. has allowed him to apply his innovative ideas in a practical setting, contributing to the company's reputation for excellence in measurement technology.

Collaborations

Throughout his career, Udrekh has collaborated with talented individuals such as Alexander Shteinfeld and Richard Lydon. These collaborations have enriched his work and fostered a creative environment for innovation.

Conclusion

Udrekh Gavale's contributions to measurement technology through his patent and work at Sick Inc. highlight his role as an influential inventor. His innovative methods continue to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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