Udaya B Patri

Title: Udaya B Patri: Innovator in Chemical Mechanical Polishing

Introduction

Udaya B Patri is a notable inventor based in Potsdam, NY (US). He has made significant contributions to the field of chemical mechanical polishing, particularly in the development of polishing slurries. With a total of 2 patents, his work has advanced the efficiency and effectiveness of polishing processes in various applications.

Latest Patents

Udaya's latest patents focus on aqueous polishing slurries for chemical-mechanical polishing. These slurries are designed to effectively polish copper at high rates. The innovative formulations may include soluble salts of molybdenum and molybdic acid, both dissolved in an oxidizing agent. His methods for polishing copper involve using low pressures with a polishing pad and aqueous slurries that contain these soluble salts and particles of MoO, enhancing the polishing process.

Career Highlights

Udaya B Patri is currently associated with Climax Engineered Materials, LLC, where he continues to develop and refine his innovative polishing techniques. His expertise in chemical mechanical polishing has positioned him as a key player in the industry.

Collaborations

Udaya has collaborated with talented individuals such as Sreehari Nimmala and Youngki Hong, contributing to the advancement of their shared goals in polishing technology.

Conclusion

Udaya B Patri's contributions to the field of chemical mechanical polishing through his innovative patents and collaborative efforts highlight his importance as an inventor. His work continues to influence the industry and improve polishing processes.