Suwon, South Korea

U-In Chung

This inventor holds 3 USPTO granted patents and 1 EPO patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 1996-1997.

IDiyas Innovation Intelligence. (2026). Inventor Profile: U-In Chung. Retrieved from https://idiyas.com/inventor/u-in-chung-bfrc3ayu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 4.1

ph-index = 3

Forward Citations = 68(Granted Patents)


Company Filing History:


Years Active: 1996-1997

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3 patents (USPTO):Explore Patents

Title: U-In Chung: Innovator in Semiconductor Technology

Introduction

U-In Chung is a prominent inventor based in Suwon, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His innovative approaches have led to advancements in the methods used for forming dielectric layers and wire structures in semiconductor devices.

Latest Patents

One of U-In Chung's latest patents is a method of forming a dielectric layer. This method involves varying the deposition rate of a dielectric material based on the electrical polarity of an underlying layer. This technique results in excellent deposition and planarization characteristics. The process includes surface treatment of a conductive layer and the underlying dielectric to achieve different electrical polarities, allowing for effective dielectric formation. Additionally, a CVD apparatus with a DC power source is utilized, enabling low-temperature deposition and simplification of the process.

Another notable patent is a wire forming method for semiconductor devices. This method encompasses several steps, including the deposition of insulation material on a semiconductor substrate, patterning to create a first insulation layer, and forming a wire layer over the capping layer and substrate. The process also involves chemical and mechanical polishing to expose the first insulation layer and the formation of a second insulation layer. This innovative method effectively prevents issues such as lifting of the wire layer and splitting of the lower insulation layer.

Career Highlights

U-In Chung is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of semiconductor technology. His work has been instrumental in enhancing the efficiency and reliability of semiconductor devices.

Collaborations

U-In Chung has collaborated with notable coworkers, including In-seon Park and Chang-Gee Hong. Their combined expertise has contributed to the successful development of innovative technologies in the semiconductor field.

Conclusion

U-In Chung's contributions to semiconductor technology through his patents and work at Samsung Electronics Co., Ltd. highlight his role as a key innovator in the industry. His methods for forming dielectric layers and wire structures are paving the way for advancements in semiconductor manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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