Alpharetta, GA, United States of America

Tzyy-Jiuan Hwang


Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 84(Granted Patents)


Company Filing History:


Years Active: 1997-1999

Loading Chart...
2 patents (USPTO):Explore Patents

Title: Innovations of Inventor Tzyy-Jiuan Hwang

Introduction

Tzyy-Jiuan Hwang, an accomplished inventor based in Alpharetta, GA, has made significant contributions to the field of chemical engineering through his innovative patents. With a total of two patents to his name, Hwang's work focuses on advanced techniques for applying functional coatings and enhancing the efficiency of gas burners.

Latest Patents

Hwang's latest patents demonstrate his expertise in combustion and deposition methods. The first patent, titled "Combustion Chemical Vapor Deposition of Phosphate Films and Coatings," presents a novel approach to applying coatings to various substrates. This method involves mixing a reagent with a carrier solution and igniting the mixture to create a flame or utilizing a plasma torch. The vaporized reagent is then deposited onto a substrate, allowing for control over the coating's orientation. This innovative process has applications in creating thin phosphate films and coatings.

The second patent, "Advanced Radiant Gas Burner and Method Utilizing Flame Support Rod," introduces a high-intensity and high-efficiency radiant gas burner. The design features a housing that facilitates gas injection and distribution, along with a porous ceramic layer that maximizes energy transfer. Additionally, elongated flame support rods enhance the burner’s radiation intensity and efficiency. The incorporation of a rod adjustment mechanism and temperature sensors allows for real-time optimization of the burner’s performance.

Career Highlights

Throughout his career, Tzyy-Jiuan Hwang has been associated with notable organizations such as the Gas Research Institute and Georgia Tech Research Corporation. His roles in these institutions have allowed him to develop and refine his innovative ideas, contributing significantly to advancements in combustion and deposition technologies.

Collaborations

Hwang has collaborated with esteemed colleagues such as K.J. Lee and Joe Kennedy Cochran, Jr. Their joint efforts have further enhanced the development of efficient technologies in their respective fields, showcasing the importance of teamwork in research and invention.

Conclusion

The contributions of Tzyy-Jiuan Hwang to the field of chemical engineering are marked by his innovative patents and collaborations. His advancements in combustion chemical vapor deposition and radiant gas burner technologies not only illustrate his prowess as an inventor but also highlight the practical applications of his work in various industries. Hwang's ongoing efforts continue to inspire future innovations in the realm of engineering and technology.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…