Tzu-Wen Shih

Title: Tzu-Wen Shih: Innovator in Semiconductor Technology

Introduction

Tzu-Wen Shih is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patents. His work focuses on enhancing the performance and efficiency of electronic devices.

Latest Patents

One of Tzu-Wen Shih's notable patents is titled "Electronic device employing two-dimensional electron gas with reduced leakage current." This patent describes a semiconductor device that features an insulating region surrounding an active area. The active area includes a channel direction and a transverse direction, with a source region and a drain region spaced apart along the channel direction. The channel comprises a two-dimensional electron gas (2DEG), which plays a crucial role in reducing leakage current. The design also includes a gate line oriented along the transverse direction, enhancing the device's functionality.

Career Highlights

Tzu-Wen Shih is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has allowed him to collaborate with other talented professionals and contribute to groundbreaking advancements in technology.

Collaborations

Some of Tzu-Wen Shih's coworkers include Der-Ming Kuo and Ching-Hua Chiu. Their collaborative efforts have further propelled innovation within the semiconductor sector.

Conclusion

Tzu-Wen Shih's contributions to semiconductor technology, particularly through his patent on electronic devices, highlight his role as an influential inventor. His work continues to impact the industry positively, paving the way for future advancements.