Tzu-Shih Yeu

Title: **Innovative Semiconductor Fabrication by Tzu-Shih Yeu**

Introduction

Tzu-Shih Yeu, an accomplished inventor located in Hsin-Chiu, Taiwan, has made significant contributions to the field of semiconductor technology. With a focus on enhancing fabrication techniques for integrated circuit devices, his work is instrumental in addressing the challenges faced in the production of modern electronic components.

Latest Patents

Tzu-Shih Yeu holds a patent for a groundbreaking invention titled "Method of Low-K/Copper Dual Damascene." This innovative method pertains to the fabrication of semiconductor integrated circuits, particularly in the dual and single inverse copper damascene processes. The invention enables the simultaneous formation of conducting copper interconnects and contact vias, utilizing low dielectric constant intermetal dielectrics (IMD) that can include various materials such as doped oxides, organic materials, highly fluorinated films, and porous materials. By employing advanced process controls like polysilicon etching of sacrificial polysilicon, plasma ashing of patterning photoresists, and meticulous post-cleaning, Tzu-Shih Yeu's invention effectively mitigates the issues associated with conventional dual damascene processes.

Career Highlights

Tzu-Shih Yeu works with the Taiwan Semiconductor Manufacturing Company (TSMC), a leading player in the semiconductor industry. His expertise and pioneering work in dual damascene processes have positioned him as a key figure in semiconductor manufacturing, contributing to the overall advancement of technology in this area. The patent solidifies his status as an inventor dedicated to improving fabrication methods, ensuring higher efficiency and performance in semiconductor devices.

Collaborations

Throughout his career, Tzu-Shih Yeu has collaborated with notable colleagues, including An-Chun Tu and Shih-Kuan Tai. These partnerships have enriched his research and development efforts, fostering an environment of innovation and shared knowledge that further drives progress in semiconductor technology.

Conclusion

Tzu-Shih Yeu's contributions to semiconductor fabrication through his patented method of low-K/copper dual damascene demonstrate the importance of innovative thinking in technology. His work not only addresses existing challenges in the industry but also paves the way for future advancements in integrated circuit manufacturing. As technology continues to evolve, inventors like Tzu-Shih Yeu remain crucial in shaping the landscape of semiconductor applications.