Kaohsiung, Taiwan

Tzu-Hua Feng

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Taiwan Hopax Chems. Mfg. Co., Ltd.. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tzu-Hua Feng. Retrieved from https://idiyas.com/inventor/tzu-hua-feng

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Tzu-Hua Feng: Innovator in Electroplating Additives

Introduction

Tzu-Hua Feng is a notable inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of electroplating through his innovative work on carboxyl sulfonate compounds. His research focuses on enhancing the efficiency and effectiveness of electroplating processes.

Latest Patents

Tzu-Hua Feng holds a patent for an electroplating additive and its preparation method. The invention provides a carboxyl sulfonate compound with a specific structure that demonstrates excellent chelating ability to metal ions. This compound is particularly useful in electroplating applications, improving the quality and performance of the plating process.

Career Highlights

Feng is currently employed at Taiwan Hopax Chems. Mfg. Co., Ltd., where he continues to develop innovative solutions in the chemical manufacturing sector. His work has garnered attention for its practical applications in various industries.

Collaborations

Tzu-Hua Feng collaborates with talented individuals such as Kun-Hsin Lee and Ying-Jin Chen. Their combined expertise contributes to the advancement of their projects and the overall success of their endeavors.

Conclusion

Tzu-Hua Feng is a distinguished inventor whose work in electroplating additives showcases his innovative spirit and dedication to improving industrial processes. His contributions are valuable to the field and highlight the importance of research and development in advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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