Hsinchu, Taiwan

Tzu-Chieh Su

USPTO Granted Patents = 3 

Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2022-2025

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3 patents (USPTO):Explore Patents

Title: Tzu-Chieh Su: Innovator in Semiconductor Technology

Introduction

Tzu-Chieh Su is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of advanced FinFET structures. With a total of 3 patents to his name, Su's work focuses on optimizing source and drain features to enhance device performance.

Latest Patents

One of Tzu-Chieh Su's latest patents is titled "Optimized proximity profile for strained source/drain feature and method of fabricating thereof." This patent discloses innovative source and drain formation techniques that provide FinFETs with reduced channel resistance and minimized drain-induced barrier lowering (DIBL). The patent describes an exemplary three-step etch method for forming a source/drain recess in a source/drain region of a fin. This method includes a first anisotropic etch, an isotropic etch, and a second anisotropic etch. The first anisotropic etch and the isotropic etch are specifically tuned to define the location of a source/drain tip. The depth of the source/drain recess after the first anisotropic etch and the isotropic etch is less than a target depth. The second anisotropic etch is then tuned to extend the depth of the source/drain recess to the target depth. The source/drain tip is positioned near the top of the fin to reduce channel resistance, while the bottom portion of the source/drain recess is spaced a distance from a gate footing to minimize DIBL. Finally, the source/drain recess is filled with an epitaxial semiconductor material.

Career Highlights

Tzu-Chieh Su has established himself as a key figure in the semiconductor industry. He is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to innovate and develop cutting-edge technologies. His work has been instrumental in advancing the capabilities of FinFET devices, which are critical for modern electronic applications.

Collaborations

Throughout his career, Tzu-Chieh Su has collaborated with several talented individuals, including Chun-An Lin and Kuo-Pi Tseng. These collaborations have further enhanced the impact of his inventions and contributed to the success of their projects.

Conclusion

Tzu-Chieh Su is a notable inventor whose work in semiconductor technology has led to

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