Ramat Gan, Israel

Tzach Livne

This inventor holds 1 USPTO granted patent. Top assignee: Irt Inspection Research and Technologies Ltd.. Active years: 1994.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tzach Livne. Retrieved from https://idiyas.com/inventor/tzach-livne

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 1994

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1 patent (USPTO):Explore Patents

Title: Tzach Livne: Innovator in Data Acquisition and Processing

Introduction

Tzach Livne is a notable inventor based in Ramat Gan, Israel. He has made significant contributions to the field of data acquisition and processing. His innovative work focuses on analyzing flaws in materials, which has important implications for various industries.

Latest Patents

Tzach Livne holds a patent for an "Apparatus and method for data acquisition and processing." This invention features a programmable receiver designed to detect signals reflected from or transmitted through materials. The technology allows for the analysis of flaws within these materials by dividing the signals into multiple independent sections. This selective evaluation of waveform portions enhances the accuracy of flaw detection and analysis.

Career Highlights

Livne's career is marked by his dedication to advancing technology in data processing. He has been instrumental in developing methods that improve the reliability of material analysis. His work is recognized for its potential to enhance safety and quality in various applications.

Collaborations

Tzach has collaborated with notable professionals in his field, including Abraham Aharoni and Itzhack Segev. These partnerships have contributed to the success and development of his innovative projects.

Conclusion

Tzach Livne's contributions to data acquisition and processing exemplify the impact of innovation in technology. His patent and collaborative efforts highlight the importance of advancing methods for analyzing material integrity.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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