This inventor holds 3 USPTO granted patents. Top assignee: Dainippon Screen Mfg. Co., Ltd.. Active years: 1988-2000.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Yawata, JP (1988)
- Kyoto, JP (1999 - 2000)
Company Filing History:
Years Active: 1988-2000
Title: The Innovations of Tutomu Ueyama
Introduction
Tutomu Ueyama is a notable inventor based in Kyoto, Japan. He has made significant contributions to the field of substrate processing technology. With a total of three patents to his name, Ueyama's work focuses on improving the efficiency and effectiveness of chemical processing systems.
Latest Patents
Ueyama's latest patents include an apparatus for processing a substrate that provides an efficient arrangement. This invention features an atmospheric conditioning unit designed to supply temperature- and humidity-controlled air to a chemical processing part, specifically a spin coater. The unit is strategically arranged above the chemical processing part and between it and a heat treatment part, which includes both a hot plate and a cool plate. The design allows for a vertically stacked arrangement, optimizing space and functionality. The atmospheric conditioning unit receives external air through an opening, while a closed partition blocks airflow between the unit and the transport area. The controlled air forms a downflow in the spin coater, rising through an opening to mix with incoming air, which is then reused by the atmospheric conditioning unit.
Another of his patents is a substrate processing apparatus that consists of a first substrate transfer unit with a first transfer path and a second substrate transfer unit with a second transfer path. This apparatus includes a spin coating unit and a spin developing unit along the first transfer path, while a substrate cassette is positioned along the second transfer path. A substrate transport robot from the second unit selectively introduces substrates received from the first unit into external exposure apparatuses located at both ends of the second transfer path. This innovative design helps maintain operational efficiency, even when the throughput differs from that of the exposure apparatus.
Career Highlights
Tutomu Ueyama is currently employed at Dainippon Screen Mfg. Co., Ltd., where he continues to develop cutting-edge technologies in substrate processing. His work has been instrumental in advancing the capabilities of chemical processing equipment.
Collaborations
Ueyama has collaborated with several talented individuals in his field, including Masami Ohtani and Minobu Matsunaga. Their combined expertise has contributed to the success of various projects and innovations.
Conclusion
Tutomu Ueyama's contributions to substrate processing technology highlight his innovative spirit and dedication to improving industrial processes. His patents reflect a commitment to efficiency and effectiveness in chemical processing systems.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
