Dainippon Screen Mfg. Co., Ltd.

Tutomu Ueyama

Masami Ohtani

Ryuji Kitakado

Minobu Matsunaga

Kaoru Aoki

Masao Tsuji

An atmospheric conditioning unit for supplying temperature- and humidity-controlled air to a chemical processing part (spin coater) is arranged immediately above a chemical processing part, between this chemical processing part and a heat treatment part (including a hot plate and a cool plate). Namely, the chemical processing part, the atmospheric conditioning unit and the heat treatment part are vertically arranged in a stacked manner. The atmospheric conditioning unit receives external air from an opening. A closed partition is provided to block air flow between the atmospheric conditioning unit and a transport area. The temperature- and humidity-controlled air supplied from the atmospheric conditioning unit to the spin coater forms a downflow in the spin coater, and thereafter rises through an opening and joins with the air flowing from the opening, to be introduced into the atmospheric conditioning unit again and reused.

Apparatus for processing a substrate providing an efficient arrangement

A substrate processing apparatus comprises a first substrate transfer unit having a first transfer path and a second substrate transfer unit having a second transfer path. A spin coating unit and a spin developing unit are arranged along the first transfer path, and a substrate cassette is arranged along the second transfer path. A substrate transport robot of the second substrate transfer unit selectively introduces a substrate received from a substrate transport robot of the first substrate transfer unit in one of external exposure apparatuses arranged on both end portions of the second transfer path, and discharges the substrate from the exposure apparatus for transfering the same to the substrate transport robot of the first substrate transfer unit. Thereby the substrate processing apparatus can avoid or relieve reduction of operational efficiency even if its throughput is different from that of an exposure apparatus.

Substrate processing apparatus

A method for detecting a position wherein a signal outputted from a position detecting scale is detected by at least two detectors, an output value of a preceding detector of these two detectors is stored anew at the time when an output value of a following detector of the two detectors comes near a scale position on which the output value of the preceding detector is once stored and becomes equal to the output value of the preceding detector, and a position detecting signal is outputted, these steps being repeated to detect the position.

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Kyoto, Japan

Tutomu Ueyama