Company Filing History:
Years Active: 1999
Title: The Innovations of Tungsheng Yang
Introduction
Tungsheng Yang, an inventive mind based in Orlando, FL, has made significant contributions to the field of semiconductor technology. With two patents to his name, Yang has demonstrated a commitment to advancing innovative manufacturing methods within integrated circuits.
Latest Patents
Yang's latest inventions include two notable patents that address critical aspects of semiconductor fabrication. The first patent, titled "Method for Using a Hardmask to Form an Opening in a Semiconductor," presents a systematic approach to creating openings in semiconductor dielectric layers. This method utilizes a hardmask layer with a unique etch rate, ensuring precision in the formation of these openings. The process also includes steps for depositing conductive materials and effectively removing the hardmask layer after use. The method's detailed specifications allow for contact openings with widths at or below 0.25 micrometers, positioning it as a sophisticated advancement in semiconductor processing.
The second patent titled "Transistor Fabrication Method," focuses on the creation of low stack height transistors with controllable linewidths. It introduces a disposable hardmask of doped glass to define the gate, which protects both the gate and the underlying substrate during ion implantation processes to form source and drain components. This patent emphasizes the incorporation of anti-reflective coatings to mitigate reflective gate notching, allowing for the formation of various silicided and non-silicided structures.
Career Highlights
Tungsheng Yang has made strides in his career as an inventor while working for Lucent Technologies Inc. His work exemplifies a fusion of creativity and engineering, contributing to the advancement of semiconductor technologies and integrated circuit design. Yang's patents reflect both theoretical understanding and practical application in semiconductor fabrication.
Collaborations
Throughout his career, Yang has collaborated with fellow innovators Taeho Kook and Kurt George Steiner. These collaborations have undoubtedly enriched his work, fostering a productive environment for the development of advanced semiconductor technologies and innovative manufacturing techniques.
Conclusion
Tungsheng Yang's contributions to the field of semiconductor technology through his patents illustrate his dedication to innovation and engineering excellence. His methods not only enhance the precision of semiconductor fabrication but also pave the way for future advancements in electronic components. As technology continues to evolve, the impact of inventors like Yang will remain pivotal in shaping the landscape of the semiconductor industry.