Company Filing History:
Years Active: 1982-1986
Title: Innovator Tung J Chuang: Pioneering Rapid Etching Techniques
Introduction
Tung J Chuang is a prominent inventor based in Los Gatos, California, known for his significant contributions to the field of semiconductor technology. With a total of four patents to his name, Chuang has made remarkable advancements in laser etching methods, enhancing the efficiency and precision of silicon processing.
Latest Patents
Two of Chuang's latest patents showcase innovative techniques in the etching process. The first patent, titled "Rapid etching method for silicon by SF.sub.6 gas," describes a method that utilizes sulfur hexafluoride in an atmospheric environment to rapidly etch silicon at an impressive rate of approximately 45 microns per second. This process is achieved by directing a continuous laser beam, with a wavelength of about 0.6 microns or less, onto the silicon, demonstrating a breakthrough in speed and efficiency.
The second patent, "Laser induced dry chemical etching of metals," reveals a method for etching metallized substrates using laser radiation. In this process, the substrate is first exposed to a selected gas that reacts with the metal, forming a solid reaction product. Subsequently, a laser beam of suitable wavelength is employed to vaporize the reaction product, allowing for selective etching of the metal in a defined pattern. This method opens new avenues for precision manufacturing in various applications.
Career Highlights
Tung J Chuang is associated with the International Business Machines Corporation (IBM), where he applies his expertise in semiconductor technologies. His work has significantly impacted the efficiency of microfabrication processes, making him a vital asset to the organization.
Collaborations
Throughout his career, Chuang has collaborated with notable colleagues, including Lee Chen and Gangadhara Swami Mathad. These collaborations have likely fostered a rich exchange of ideas and innovations, contributing to the development of cutting-edge etching techniques.
Conclusion
Tung J Chuang stands as a noteworthy figure in the realm of semiconductor technology. His innovative patents reflect a commitment to advancing laser etching methods, which promise to enhance manufacturing processes significantly. As he continues to work at IBM, his contributions will undoubtedly shape the future of technology in profound ways.