Company Filing History:
Years Active: 2020-2025
Title: **Inventor Profile: Tung Huei Ke**
Introduction
Tung Huei Ke is a prominent inventor based in Leuven, Belgium, known for his significant contributions to the field of semiconductor devices and organic layers. With two patents to his name, his work focuses on innovative solutions that enhance device performance and manufacturing techniques.
Latest Patents
Tung's latest patents demonstrate his expertise in semiconductor technology. One of his notable inventions is the "Contaminated Interface Mitigation in a Semiconductor Device," which describes a semiconductor device featuring a substrate, layered hole-transporting, and electron-transporting layers, with specific arrangements including organic components to improve functionality. Another pioneering patent is the "Method for High-Resolution Patterning of Organic Layers," which outlines a procedure for photolithographically patterning organic layers on substrates. It includes the use of a water-soluble shielding layer and a photoresist layer, allowing for precise etching and patterning techniques.
Career Highlights
Tung Huei Ke currently works at IMEC, a leading research and innovation hub in nanoelectronics and digital technologies. His role at this esteemed institution allows him to engage in cutting-edge research that contributes to advancements in semiconductor technology and organic materials.
Collaborations
Throughout his career, Tung has collaborated with fellow researchers, including talented coworkers such as Pawel Malinowski and Atsushi Nakamura. These partnerships enhance the exchange of ideas and drive innovation within their projects, resulting in impactful technological advancements.
Conclusion
Tung Huei Ke's work exemplifies the spirit of innovation within the semiconductor industry. His patents not only address current challenges but also pave the way for future developments in device technology. As he continues to work at IMEC alongside esteemed colleagues, his contributions are sure to influence advancements within the field for years to come.