This inventor holds 1 USPTO granted patent. Top assignee: China Academy of Machinery Wuhan Research Institute of Materials Protection Co. Ltd.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Tun Cai and an Improved UHMWPE Anti-Wear Composite
Introduction
Tun Cai is an inventor based in Wuhan, China, whose work includes a patent for improving the wear resistance of ultra-high molecular weight polyethylene (UHMWPE). The invention uses manganese phosphate nanosheets to enhance the material’s performance under dry-friction conditions.
Latest Patents
Cai’s listed patent is “Ultra-high molecular weight polyethylene anti-wear composite material modified by manganese phosphate nanosheet and preparation method thereof.” The process mechanically mixes trihydrate manganese phosphate nanosheets with UHMWPE powder, then heats, molds, melts, and solidifies the mixture using hot pressing. After cooling and demolding, the modified composite material is obtained.
During friction, the nanosheets can form a manganese phosphate film that helps reduce deformation and tearing on the material’s friction surfaces. The patent describes improvements in anti-friction and anti-wear performance, including reduced friction coefficient, wear depth, and wear width under dry-friction conditions. Cai is associated with 1 patent.
Career Highlights
Cai is associated with China Academy of Machinery Wuhan Research Institute of Materials Protection Co. Ltd. His listed invention focuses on materials engineering and the development of a more wear-resistant UHMWPE composite.
Collaborations
Cai’s listed coworkers include Dan Jia and Tian Yang. Their names are associated with his professional and invention-related context.
Conclusion
Tun Cai’s patent applies manganese phosphate nanosheets to UHMWPE, offering a hot-pressing method for producing a composite designed to reduce friction and wear.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile