Company Filing History:
Years Active: 2006-2007
Title: Tuguto Maruko: Innovator in Photomask Technology
Introduction
Tuguto Maruko is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of photomask technology, holding a total of 3 patents. His work has been instrumental in advancing the methods used in chip pattern exposure.
Latest Patents
One of Tuguto Maruko's latest patents is focused on a photomask and method for exposing chip patterns. This innovative photomask includes a main mask pattern that features first chip patterns, which correspond to a maximum exposure area of a projection exposure apparatus. Additionally, the mask incorporates a sub-mask pattern that contains second chip patterns, which differ from the first chip patterns and are smaller in size. These sub-mask patterns are strategically arranged adjacent to the main mask pattern, enhancing the efficiency of the exposure process.
Career Highlights
Tuguto Maruko is currently employed at Oki Electric Industry Co., Ltd., where he continues to develop cutting-edge technologies in the semiconductor industry. His expertise in photomask technology has positioned him as a key player in the field.
Collaborations
Tuguto has collaborated with fellow inventor Shinji Tanabe, working together to push the boundaries of innovation in their respective projects.
Conclusion
Tuguto Maruko's contributions to photomask technology and his innovative patents reflect his dedication to advancing the semiconductor industry. His work continues to influence the development of efficient chip pattern exposure methods.