Nantes, France

Tugdual Oger

This inventor holds 1 USPTO granted patent, plus 1 CIPO patent and 1 EPO patent. Top assignees: Ai4r, Orano Mining. Active years: 2021.


% Patents Active = 100.0


 

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Tugdual Oger: Innovator in Alpha Particle Detection

Introduction

Tugdual Oger is a notable inventor based in Nantes, France. He has made significant contributions to the field of alpha particle detection, particularly through his innovative methods for analyzing radionuclide emitters. His work has implications for various applications in nuclear science and safety.

Latest Patents

Tugdual Oger holds a patent for an "Analyzing method using a detector of alpha particles." This method involves analyzing a sample that contains at least one radionuclide emitter of alpha particles. The detector he developed includes a detection medium and multiple measurement cells that are capable of measuring incident signals generated by the interaction of alpha particles with the detection medium. The method also includes steps for determining the initial energy of each alpha particle and constructing an energy spectrum for a specific zone of the autoradiographic image.

Career Highlights

Throughout his career, Tugdual Oger has worked with prominent companies such as Orano Mining and Ai4r. His experience in these organizations has allowed him to refine his expertise in the field of alpha particle detection and analysis.

Collaborations

Tugdual has collaborated with several professionals in his field, including Jérôme Donnard and Samuel Duval. These collaborations have contributed to the advancement of his research and innovations.

Conclusion

Tugdual Oger is a distinguished inventor whose work in alpha particle detection has paved the way for advancements in nuclear analysis. His innovative methods and collaborations highlight his commitment to enhancing safety and efficiency in this critical field.

Profile summary based on public USPTO records.
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