Kumamoto, Japan

Tsuyoshi Otsuka

This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Electron Limited. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tsuyoshi Otsuka. Retrieved from https://idiyas.com/inventor/tsuyoshi-otsuka-s97esv6m

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Tsuyoshi Otsuka: Innovator in Substrate Processing Technology

Introduction

Tsuyoshi Otsuka is a notable inventor based in Kumamoto, Japan. He has made significant contributions to the field of substrate processing technology. His innovative work has led to the development of a unique substrate processing apparatus that enhances efficiency in various applications.

Latest Patents

Otsuka holds 1 patent for his invention titled "Substrate processing apparatus and substrate processing method." This patent describes a substrate processing apparatus that includes a substrate processing unit, a substrate transfer unit, and multiple detection units. The apparatus is designed to hold and process substrates effectively, ensuring precise positioning and inclination detection during the processing phase.

Career Highlights

Tsuyoshi Otsuka is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His role involves the development and enhancement of technologies that are crucial for substrate processing. Otsuka's expertise and innovative mindset have positioned him as a valuable asset to his team and the company.

Collaborations

Otsuka has collaborated with talented coworkers such as Hiroki Harada and Tatsuhiko Tsujihashi. Their combined efforts contribute to the advancement of substrate processing technologies and the overall success of their projects.

Conclusion

In summary, Tsuyoshi Otsuka is a prominent inventor whose work in substrate processing technology has made a significant impact in the industry. His innovative patent and contributions at Tokyo Electron Limited highlight his dedication to advancing technology in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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