Company Filing History:
5 out of 1,156 
5 out of 832,843 Years Active: 2002-2007
Title: Tsuyoshi Otani: Innovator in Thin Film Technology
Introduction
Tsuyoshi Otani is a prominent inventor based in Osaka, Japan, known for his significant contributions to the field of thin film technology. With a total of 10 patents to his name, Otani has developed innovative methods that enhance the efficiency and quality of thin film production.
Latest Patents
Among his latest patents, Otani has introduced a method for forming a thin film that contains a metal oxide as the main component. This method allows for a relatively uniform film thickness at a high deposition rate over a wide area and extended time. The process utilizes a mixed gas stream containing a metal chloride, an oxidizing material, and hydrogen chloride, achieving a film deposition rate of 4500 nm/min or greater. Additionally, he has developed a method for forming a transparent thin film using a chemical vapor deposition method. This method ensures a film growth rate of at least 8 nm/s and results in a transparent thin film with high transmittance in the visible light region.
Career Highlights
Throughout his career, Tsuyoshi Otani has worked with notable companies, including Nippon Sheet Glass Company, Limited. His innovative approaches have positioned him as a key figure in the advancement of thin film technologies.
Collaborations
Otani has collaborated with esteemed colleagues such as Masahiro Hirata and Akira Fujisawa, contributing to the development of cutting-edge technologies in his field.
Conclusion
Tsuyoshi Otani's work in thin film technology exemplifies innovation and dedication to advancing materials science. His patents reflect a commitment to improving production methods and enhancing the quality of thin films used in various applications.