Osaka, Japan

Tsuyoshi Nonaka

This inventor holds 1 USPTO granted patent. Top assignee: Other. Active years: 2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tsuyoshi Nonaka. Retrieved from https://idiyas.com/inventor/tsuyoshi-nonaka-dx78rwam

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:

goldMedal1 out of 834,659 
Other
 patents

Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: The Innovations of Tsuyoshi Nonaka

Introduction

Tsuyoshi Nonaka is a notable inventor based in Osaka, Japan. He has made significant contributions to the field of technology, particularly in the area of etching processes. His work has led to advancements that are essential for various applications in the industry.

Latest Patents

Tsuyoshi Nonaka holds a patent for a "Method for etching laminated assembly including polyimide layer." This innovative method showcases his expertise in materials science and engineering, highlighting his ability to develop solutions that enhance manufacturing processes.

Career Highlights

Throughout his career, Nonaka has demonstrated a commitment to innovation and excellence. His work has not only contributed to his field but has also paved the way for future advancements in technology. With a patent portfolio that includes 1 patent, he continues to be a valuable asset in the realm of invention.

Collaborations

Nonaka has collaborated with talented individuals such as Shingo Kaimori and Masato Tsurugasaki. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

In summary, Tsuyoshi Nonaka is a distinguished inventor whose contributions to the field of etching technology are noteworthy. His innovative methods and collaborations with other professionals underscore his impact on the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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